Home Products Tosoh® ES-2000 Synthetic Fused Silica

Tosoh® ES-2000 Synthetic Fused Silica

Tosoh® ES-2000 is a high-purity synthetic fused silica material for UV optics, semiconductor process parts, excimer laser windows and precision metrology components. With 170–2500 nm transmission, low thermal expansion of 0.51 × 10⁻⁶ /°C and SiO₂ purity above 99.99%, it is suitable for components requiring stable UV performance, low impurity levels and reliable dimensional control.

We process Tosoh® ES-2000 fused silica according to drawings, thickness, surface quality and application requirements, including cutting, grinding, polishing and drilling.

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Details Introduction

1. Basic Information

Item	Specification
Material Type	Synthetic Fused Silica
Brand	Tosoh®
Grade	ES-2000
Typical OH Content	≈ 600–1000 ppm (High OH)
Density	2.20 g/cm³

2. Thermal Properties

Item	Specification
CTE (0–300°C)	0.51 × 10⁻⁶ /°C
Softening Point	≈ 1585°C
Annealing Point	≈ 1042°C
Strain Point	≈ 890°C
Thermal Conductivity	1.38 W/(m·K)

3. Mechanical Properties

Item	Specification
Young’s Modulus	72.5 GPa
Shear Modulus	31.2 GPa
Poisson’s Ratio	0.17
Knoop Hardness	≈ 520 kg/mm²
Flexural Strength	≈ 65 MPa

4. Optical Properties

Item	Specification
Refractive Index @ 587.6 nm	1.4584
Abbe Number	67.7
Transmission Range	170–2500 nm
UV Transmission	Excellent (Deep UV)
Homogeneity	Δn ≤ 2 × 10⁻⁶

5. Electrical Properties

Item	Specification
Dielectric Constant (20°C, 1 MHz)	3.75
Loss Tangent	≈ 0.0001
Volume Resistivity	> 10¹⁸ Ω·cm
Dielectric Strength	≈ 250–400 kV/cm

6. Chemical Purity

Item	Specification
SiO₂ Content	> 99.99%
Metal Impurities	< 1 ppm (total)
Bubbles & Inclusions	Extremely Low
Chemical Resistance	Excellent (except HF)

7. Typical Applications

Field	Application
Semiconductor	Photolithography Windows, Diffusion Tubes, Wafer Carriers
Optics	UV Optical Elements, Precision Lenses
Laser	Excimer Laser Optics, UV Laser Windows
Metrology	Reference Flats, Optical Standards